Laboratory for Reliable Nanoelectronics

The Laboratory for Reliable Nanoelectronics is an advanced facility for semiconductor device process development, test structure design for reliability and reliability measurements at the University of Maryland. It includes a broad variety of advanced materials processes and supporting processes for fabricating of devices and reliability test structures.

Aris Christou

301-405-5208 |


To support these activities, the facility houses a wide variety of equipment for wet and dry semiconductor processes as well as analytical tools. It includes a UHV system for Atomic Layer Deposition and a MAS 400 mask aligner for high resolution contact lithography, an e-beam metallization chamber, sol-gel and photoresist spinners, annealing and oxidation furnances, several optical microscopes as well as a variety of chemcial gas sensors (RGAs, FTIR, acoustic sensors) for in-situ process diagnostics.

The following is a list of equipment within the facility:

  • UHV Atomic Layer Deposition system
  • High density plasma etch cluster tool, Alliance 9440
  • MAS 400 IR/VIS mask aligner
  • 4 point probe station for sheet resistance measurements
  • Residual gas analyzer, Inficon 300 amu
  • Residual gas analyzer, Inficon 200 amu
  • Gas phase acoustic sensor, Inficon Composer
  • FTIR compact spectrometer, Inficon
  • E-bean metal evaporator, CV8 Airo Temescal
  • 8" sol-gel spincoater
  • SP 100 Bidtec controller
  • 8" photoresist spincoater, SP 100 Bidtec
  • Programmable hot plate, 400C; for sol-gel and photoresist
  • Programmable furnace, Vulcan 3-550
  • Oven, Blue M, Electric Gal. Signal L
  • Oven, Lindberg, Electric Gal. Signal L
  • Oxidation tubular furnace, Blue M
  • Microbalance, 1/10000g
  • Microscope, Ferroscope L.
  • Microscope, Optiphot POL, Nikon
  • Barnes Infrared Microscope
  • Scanning Acoustic Microscope